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日本三洋电机筑波研究所和工业技术研究院电子技术综合研究所射束应用研究室,开发了使用聚焦离子束在0.04微米的极微细的线宽上加工保护膜(感光剂)的超大规模集成电路加工技术。
Japan Sanyo Electric Co., Ltd. Tsukuba Institute of Technology and Industrial Technology Research Institute of Electronics Technology beam application laboratory, the development of the use of focused ion beam processing at 0.04 microns on the very fine line width protective film (photosensitizer) VLSI Processing Technology.