论文部分内容阅读
用微波等离子体化学气相沉积法（ MPCVD）在氧化铝陶瓷衬底上成功地制备出具有 [100] 织构的金刚石薄膜，并对该薄膜进行了 X射线衍射（ XRD）、扫描电子显微镜（ SEM）和 Raman光 谱分析。由于氦原子具有高的电离能，因此本工作在反应气氛中引入了少量的氦，以提高氢等离 子体的刻蚀效率。实验结果表明，少量氦气的引入促进了等离子体对非（ 100）面的选择性刻蚀， 从而也有利于金刚石薄膜的 [100]织构生长。
The diamond films with [100] texture were successfully prepared on alumina ceramic substrates by microwave plasma chemical vapor deposition (MPCVD). The films were characterized by X-ray diffraction (XRD), scanning electron microscopy ) And Raman spectroscopy. Due to the high ionization energy of helium atoms, this work introduced a small amount of helium in the reaction atmosphere to improve the etching efficiency of the hydrogen plasma. Experimental results show that the introduction of a small amount of helium promotes selective plasma etching of the non-(100) surface, which is also beneficial to the [100] texture growth of diamond films.