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对通过蒸发获得的金属铋薄膜经加热氧化处理并与直接蒸发氧化铋获得的薄膜比较和进行光学性能测量，发现都能获得β相氧化铋薄膜。但是由于热氧化与蒸发的过程或速率不同，出现化学计量偏离，薄膜结构和光学性能变化。热氧化不够或低速率蒸发形成薄膜富铋，出现无定型或其它相结构，光学吸收限变宽，移向低能处。过氧化则会使薄膜富氧，同样使结构变化，吸收限变宽而向高能方向移动。实验表明蒸发金属铋薄膜然后经３５０℃，３小时热氧化是比较合适的制备氧化铋薄膜的条件。
The bismuth oxide film obtained by evaporation was subjected to thermal oxidation treatment and compared with the film obtained by direct evaporation of bismuth oxide, and the optical property measurement was performed. However, due to the difference in the process or rate of thermal oxidation and evaporation, stoichiometric deviations, changes in film structure and optical properties occur. Thermal oxidation is not enough or low rate evaporation of the film-rich bismuth, there amorphous or other phase structure, the optical absorption limit widening, moving to low energy. Peroxide will make the film oxygen-rich, the same changes in the structure, the absorption limit to widen and move to high-energy direction. Experiments show that evaporation of bismuth metal film and then by 350 ℃, 3 hours thermal oxidation is more appropriate preparation of bismuth oxide film conditions.