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用Ａｕｇｅｒ电子能谱（ＡＥＳ）对Ｘ光激光实验使用的Ｎｄ薄膜靶的表面氧化进行了分析，结合Ａｒ离子束刻蚀进行元素的深度分布剖析，得到了表面氧化层厚度，所得结果与Ｒｕｔｈｅｒ－ｆｏｒｄ背散射（ＲＢＳ）方法测量的结果相吻合。实验表明，样品暴露在空气中２０至３０ｍｉｎ，氧化即基本达到饱和，相应的氧化层厚度约为２０ｎｍ，氧化层的组分以ＮｄＯ为主
The surface oxidation of the Nd film target used in the X-ray laser experiment was analyzed by Auger electron spectroscopy (AES) and the depth profile of the element was analyzed by Ar ion beam etching. The obtained results are in good agreement with those of the Ruther- ford backscatter (RBS) method to measure the results of the agreement. Experiments show that the samples exposed to the air 20 to 30min, the oxidation that is basically saturated, the corresponding oxide layer thickness of about 20nm, the oxide layer of the composition of NdO-based