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利用等离子体增强磁控溅射离子镀（ＰＥＭＳＩＰ）技术在铁基体上沉积ＴｉＮ涂层之前，先镀一层很薄的钛中间层，继之再沉积ＴｉＮ。研究了基片负偏压对涂层相组成的影响。结果表明，随着基片负偏压增加，膜层的相分朝着富氮相及其含量增加的方向发展，变化趋势为（α－Ｔｉ＋Ｔｉ_２Ｎ＋ＴｉＮ）→（Ｔｉ_２Ｎ＋ＴｉＮ）→ＴｉＮ。在基体与中间层界面处有ＦｅＴｉ相；在中间层与后继膜的交接处，发现α＝１与Ｔｉ_２Ｎ有取向关系。
Prior to depositing a TiN coating on an iron substrate by plasma-enhanced magnetron sputter ion plating (PEMSIP), a thin titanium interlayer is deposited followed by deposition of TiN. The effect of substrate negative bias on the phase composition was investigated. The results show that with the increase of substrate negative bias, the phase of the film grows toward the nitrogen-rich phase and its content increases. The changing trend is (α-Ti + Ti_2N + TiN) → (Ti_2N + TiN) → TiN. There is FeTi phase at the interface between the substrate and the intermediate layer. In the interface between the intermediate layer and the subsequent film, α = 1 has an orientation relationship with Ti_2N.