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采用K575X高分辨率溅射仪在单晶硅衬底上制备镍纳米催化剂薄膜。研究了高温氨气刻蚀对镍催化剂由连续薄膜转变成纳米颗粒的影响。探讨了预处理时间、温度和催化剂薄膜原始厚度等工艺参数对镍薄膜微结构的影响,得到了镍催化剂薄膜的氨预处理规律,并初步分析了氨气对其形貌变化的影响机理。研究结果表明,获得均匀、细小和高密度过渡镍金属催化剂颗粒的工艺条件是预处理时间、温度和催化剂薄膜原始厚度分别为12min8、00℃和10nm。
Nickel nanocatalyst films were prepared on monocrystalline silicon substrates using a K575X high resolution sputter. The effects of high temperature ammonia gas etching on the conversion of Ni catalysts from continuous thin films to nanoparticles were investigated. The effects of pretreatment time, temperature and original thickness of catalyst film on the microstructure of nickel thin film were discussed. The pretreatment rules of nickel catalyst thin film were obtained. The influence mechanism of ammonia on morphology was also analyzed. The results show that the pretreatment time, temperature and initial thickness of the catalyst film are 12min 8,00 ℃ and 10nm respectively for obtaining uniform, fine and high density transition nickel metal catalyst particles.