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爆轰法合成的超微金刚石在化学气相沉积 (chemicalvapordepositionCVD)金刚石薄膜的过程中可以起到类似“晶籽”的促进成核的作用 ,在直流电弧等离子体喷射 (DCPlasmaJet)装置上进行的实验结果显示 ,在有UFD涂层的衬底上进行沉积可以使成核率提高 2～ 3倍 ,薄膜的形貌也与正常工艺得到的薄膜有所不同 .较高的衬底温度可能会使部分UFD发生氧化或无定形化 .进一步的研究应着眼于改善UFD的性质和降低基底温度 .
The detonation-synthesized ultrafine diamond can act like a “seed” in promoting nucleation during the chemical vapor deposition (CVD) diamond thin film. The experimental results on the DCPlasmaJet Shows that deposition on a UFD-coated substrate can increase the nucleation rate by a factor of 2 to 3. The morphology of the film is also different from that obtained with normal processes.High substrate temperature may cause some UFD Oxidation or amorphization occurs.Further research should focus on improving the properties of UFD and reducing the substrate temperature.