TD处理制备的VC涂层XPS谱与EDS面扫描分析(英文)

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以无水硼砂、FeV50和FeSi45为主要原料,通过TD和扩散处理在Cr12MoV基体表面制备了VC涂层。利用扫描电镜(SEM)、X射线衍射(XRD)、X射线光电子能谱(XPS)和能谱分析(EDS)等手段对VC的组织结构和化学元素分布进行了表征。用能谱面扫描分析了VC涂层表面和界面化学元素分布,对其界面冶金结合机理进行了探讨。结果表明,VC涂层为C和V两元素组成的化合物,其中V原子浓度大约是C原子的2倍;VC涂层为单一的VC相,V元素电子结合能位于512.8 e V,C元素电子结合能位于282.2 eV;V、C和Fe等元素在涂层界面处发生了相互扩散,形成了界面扩散层,涂层-基体结合界面为冶金结合方式。 With anhydrous borax, FeV50 and FeSi45 as the main raw materials, VC coating was prepared on the surface of Cr12MoV substrate by TD and diffusion treatment. The microstructure and chemical element distribution of VC were characterized by SEM, XRD, XPS and EDS. The surface and interfacial chemical elements distribution of VC coating were analyzed by energy spectrum scanning, and the interface metallurgical bonding mechanism was discussed. The results show that the VC coating is a compound of two elements C and V. The concentration of V atom is about twice that of C atom. The VC coating is a single VC phase, the electron binding energy of V element is at 512.8 eV, The binding energies are at 282.2 eV. V, C, Fe and other elements interdiffuse at the coating interface to form an interfacial diffusion layer. The coating-substrate interface is a metallurgical bond.
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