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浅射现象是Crove在1842年发现的.从1870年开始已经知道浅射能够用来制成膜,但是作为工业技术上的实际应用是1930年以后的事.本校的齐藤幸男名誉教授从1920年起就把这种技术称为“阴极飞浅法”.用它试制了各种金属膜,并对其性能进行了研究.虽然这种浅射法具有比真空蒸发法更久的历史,但是由于成膜速率低和使基片表面过热现象而限制了其用途.另一方面,真空蒸发法由于新型的蒸发源和高性能的真空排气系统的发展,已广泛
The phenomenon of shallow reflection was discovered by Crove in 1842. It has been known since the beginning of 1870 that shallow shots can be used to form films, but practical use as an industrial technique is beyond 1930. Emeritus Professor Saito Yoshinobu from 1920 This technology has been called the “cathode fly shallow method.” It uses a variety of trial production of various metal films, and its performance was studied. Although this shallow shot method has a longer history than the vacuum evaporation method, Due to the low deposition rate and overheating of the substrate surface, the utility of the vacuum evaporation method is limited, and on the other hand, the vacuum evaporation method has been widely developed due to the development of new evaporation sources and high-performance vacuum exhaust systems