Influence of growth rate on the carbon contamination and luminescence of GaN grown on silicon

来源 :Journal of Semiconductors | 被引量 : 0次 | 上传用户:turtle0906
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The unintentional carbon doping concentration of GaN films grown by low pressure metal organic chemical vapor deposition(LP-MOCVD) depends strongly on the growth rate. The concentration of carbon is varied from 2.9x10 17 to 5.7x10 18 cm-3 when the growth rate increases from 2.0 to 7.2 m/h, as detected by secondary ion mass spectroscopy. It is shown that the presence of N vacancies give rises to high carbon concentration. We show that a reduction of the carbon concentration by one order of magnitude compared to the regular sample with nearly same growth rate can be achieved by operating at an extremely high NH3 partial pressure during growth. The intensity ratios of yellow and blue luminescence to band edge luminescence in the samples are found to depend significantly on carbon concentration. The present results demonstrate direct and quantitative evidence that the carbon related defects are the origin of yellow and blue luminescence. The unintentional carbon doping concentration of GaN films grown by low pressure metal organic chemical vapor deposition (LP-MOCVD) depends strongly on the growth rate. The concentration of carbon is varied from 2.9 × 10 17 to 5.7 × 10 18 cm -3 when the growth rate increases from 2.0 to 7.2 m / h, as detected by secondary ion mass spectroscopy. It shows that the presence of N vacancies gives rise to high carbon concentration. We show that a reduction of the carbon concentration by one order of magnitude compared to the regular sample with nearly same growth rate can be achieved by operating at an extremely high NH3 partial pressure during growth. The intensity results of yellow and blue luminescence to band edge luminescence in the samples were found to depend significantly on carbon concentration. direct and quantitative evidence that the carbon related defects are the origin of yellow and blue luminescence.
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