EFFECTS OF COPPER ION IMPLANTATION ON ANTIBACTERIAL ACTIVITY OF AISI420 STAINLESS STEEL

• 作 者: Z.G.Dan H.W.Ni B.F.Xu J.Xiong P.Y.Xiong
• 机 构: School of Material and Metallurgy, Wuhan University of Science and Technology, Wuhan 430081, China;S
• 出 处: 金属学报(英文版)
• 发表日期: 2005年2期
• 关键词: antibacterial stainless steel copper ion implantation saturation dose Cu-contain

Antibacterial activity of AISI420 stainless steel (SS) implanted by copper was investigated. Ions extracted from a metal vapor vacuum arc (MEVVA) are sourced with 100keV energy and a dose range from 0.2×1017 to 2.0×1017ions .cm-2. The saturation dose of Cu implantation in AISI420 SS and Cu surface concentration were calculated at the energy of 100keV. The effect of dose on the antibacterial activity was analyzed. Results of antibacterial test show that the saturation dose is the optimum implantation dose for best antibacterial activity, which is above 99% against both Escherichia coli and Staphylococcus aureus. Novel phases such as Fe4Cu3 and Cu9.9Fe0.1 were found in the implanted layer by glancing angle X-ray diffraction (GXRD). The antibacterial activity of AISI420 SS attributes to Cu-contained phase.