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采用等离子增强磁控溅射技术(PEMC)在YG8硬质合金表面制备了(Ti,Al,Si,Cr)N超硬膜,研究了N2流量对膜层结构、成分、形态特征与性能的影响。结果表明,所得薄膜为面心立方结构,随N2流量增加,薄膜的晶体学取向由(111)晶面向(200)晶面转变。薄膜表面呈现柱状晶形态,N2流量为70 sccm(标况mL/min)时,柱状晶尺寸最小,粗糙度最低。所得薄膜的硬度随N2流量的增加先增大后减小,N2流量为70 sccm时,达到最大值35.70 GPa。
The (Ti, Al, Si, Cr) N superhard coatings on YG8 cemented carbide were prepared by plasma enhanced magnetron sputtering (PEMC). The effects of N2 flux on the structure, composition, morphology and properties of the coatings were studied . The results show that the obtained film has a face-centered cubic structure. With the increase of the flow rate of N2, the crystallographic orientation of the film changes from the (111) crystal plane to the (200) crystal plane. The surface of the film presents columnar crystal morphology. When N2 flow rate is 70 sccm (standard mL / min), the columnar crystal has the smallest size and the lowest roughness. The hardness of the obtained film first increases and then decreases with the increase of N2 flow rate, reaching a maximum of 35.70 GPa at N2 flow rate of 70 sccm.