Contamination process and laser-induced damage of HfO_2/SiO_2 coatings in vacuum

• 作 者: 马平 潘峰 陈松林 王震 胡建平 张清华 邵建达
• 机 构: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences,Chengdu Fine Optical En
• 出 处: Chinese Optics Letters
• 发表日期: 2004年期
• 关键词: contamination vacuum transmittance comes contaminated silica spectrometer evapor

The performances of HfO2/SiO2 single and multi-layer coatings in vacuum influenced by contamination are studied. The surface morphology, the transmittance spectrum, and the laser-induced damage threshold are investigated. The results show that the contamination in vacuum mainly comes from the vacuum system and the contamination process is different for the HfO2 and SiO2 films. The laser-induced damage experiments at 1064 nm in vacuum show that the damage resistance of the coatings will decrease largely due to the organic contamination.

The performances of HfO2 / SiO2 single and multi-layer coatings in vacuum influenced by contamination are studied. The surface morphology, the transmittance spectrum, and the laser-induced damage threshold are investigated. The results show that the contamination in vacuum mainly comes from the vacuum system and the contamination process is different for the HfO2 and SiO2 films. The laser-induced damage experiments at 1064 nm in vacuum show that the damage resistance of the coatings will minimize decided due to the organic contamination.