Effects of Bias Voltage on the Structure and Mechanical Properties of Thick CrN Coatings Deposited b

• 作 者: 容双全 何俊 王红军 田灿鑫 郭立平 付德君
• 机 构: Accelerator Lab,Department of Physics,Key Laboratory of Acoustic and Photonic Materials and Devices
• 出 处: Plasma Science and Technology
• 发表日期: 2004年期
• 关键词: magnetron sputtering fibrous columnar disperse attributed grains sizes holder fa

Thick CrN coatings were deposited on Si(111)substrates by electron source assistedmid-frequency magnetron sputtering working at 40 kHz.The deposition rate,structure.andmicrohardness of the coatings were strongly influenced by the negative bias voltage(V_b).Thedeposition rate reached 8.96 μm/h at a V_b of-150 V.X-ray diffraction measurement revealedstrong CrN(200)orientation for films prepared at low bias voltages.At a high bias voltage of V_bless than-25 V both CrN(200)and(111)were observed.Large and homogeneous grains wereobserved by both atomic force microscopy and scanning electron microscopy in samples preparedunder optimal conditions.The samples exhibited a fibrous microstructure for a low bias voltageand a columnar structure for V_b less than-150 V.

Thick CrN coatings were deposited on Si (111) substrates by electron source assisted mid-frequency magnetron sputtering at 40 kHz. The deposition rate, structure. And microhardness of the coatings were strongly influenced by the negative bias voltage (V_b) .dedeposition rate reached 8.96 μm / h at a V_b-150 VX-ray diffraction measurement revealeds CrN (200) orientation for films prepared at low bias voltages. A high bias voltage of V_bless than-25 V both CrN (200) and (111) were observed . Large and homogeneous grains wereobserved by both atomic force microscopy and scanning electron microscopy in samples prepared by optimal conditions. The sample exhibited a fibrous microstructure for a low bias voltage and a columnar structure for V_b less than-150 V.