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采用直流反应磁控溅射法淀积ZrN薄膜发现在（100）晶向硅片上ZrN薄膜按（111）晶向生长，控制生长工艺可以获得ZrN（111）晶向的外延生长膜．
The deposition of ZrN thin film by DC reactive magnetron sputtering shows that the ZrN thin film grows in the (111) crystal orientation on the (100) crystal silicon wafer and the ZrN (111) epitaxial growth film can be obtained by controlling the growth process.