Simulation methods of ion sheath dynamics in plasma source ion implantation

• 作 者: WANG Jiuli ZHANG Guling Wang Y
• 机 构: Institute of Physics,State Key Laboratory of Materials Modification by Laser
• 出 处: 科学通报（英文版）
• 发表日期: 2004年期
• 关键词: plasma sheath simulation plasma source ion implantation fluid model particle sim
• 基金项目: 北京市科委科研项目;国家高技术研究发展计划(863计划);国家自然科学基金

Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main problem of nonuniform ion implantation on the target in PSII is discussed by analyzing some calculated results. In addition, based on the relative researches in our laboratory, some calculated results of the ion sheath dynamics in PSII for inner surface modification of a cylindrical bore are presented. Finally, new ideas and tendency for future researches on ion sheath dynamics in PSII are proposed.