论文部分内容阅读
研制了一种由多个空心阴极并列组合而成的可直接作为溅射靶的多重空心阴极溅射靶。其溅射输出量可用靶电压、气压及空心阴极的高度和宽度的比值控制。将多重空心阴极溅射靶应用于双辉离子金属渗镀试验。结果表明 ,这种方法可以加速金属渗镀层的形成。在靶电流密度较大的条件下 ,可以形成合金扩散层和纯金属沉积层的复合层组织
A multi-hollow cathode sputtering target that can be directly used as a sputtering target by combining several hollow cathodes in parallel is developed. The sputtering output can target voltage, air pressure and hollow cathode height and width ratio control. Multiple hollow cathode sputtering target is applied to double-hull ion metal plating test. The results show that this method can accelerate the formation of metal coating. Under the condition of large target current density, the composite layer structure of alloy diffusion layer and pure metal deposition layer can be formed