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本文总结了HL=1装置在1984—1987年度运行期间的真空壁条件,等离子体环电压与杂质百分浓度的关系;并估算了GH39金属孔栏,G3石墨孔栏和蒸钛条件下等离子体中的碳、氧杂质的平均密度。真空室的主要杂质气体的总压强从1984年的5.3×10~(-5)Pa降到1987年的1.1×10~(-5)Pa。仅当本底真空p_o≤1.3×10~(-5)Pa,H_2O组份的百分浓度PH_2O/PH_2≤5％时,才能满足正常托卡马克放由要求的壁初开始条件。
This paper summarizes the vacuum wall conditions and the relationship between the plasma ring voltage and the impurity concentration of HL = 1 device during the operation from 1984 to 1987. The effects of GH39 metal hole, G3 graphite hole and steamed titanium plasma In the carbon, the average density of oxygen impurities. The total pressure of the main impurities in the vacuum chamber decreased from 5.3 × 10 -5 Pa in 1984 to 1.1 × 10 -5 Pa in 1987. Only when the background vacuum p_o≤1.3 × 10 ~ (-5) Pa and the percentage concentration of H_2O component is PH_2O / PH_2≤5%, can the normal initial tokens be satisfied.