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1972年5月7—11日,在美国德克萨斯州休斯敦城召开了电化学会议第141次例会。这次会议的特点是:(1)有关离子注入法的报告较多,内容方面基础东西较少,大都是从研究和发展到生产阶段的介绍。(2)半导体方面也没有什么新的题目,大多是一些从实用角度上看来较重要的报告。例如关于外延层中的寿命,以及在1250℃以上扩散时使用 BN 等。(3)发表了11篇有关磁泡的论文,其中8篇是贝尔实验室和国际商业机器公司发表的。其中值得重视的几个题目介绍如下。
The 141st Ordinary Meeting of Electrochemical Meetings was held in Houston, Texas from July 7 to May 1972. The characteristics of this meeting are: (1) There are more reports on ion implantation, with less content on the basis of content, most of which are introduced from research and development to production. (2) There are also no new topics in semiconductors, mostly reports that are more important from a practical point of view. For example, regarding the lifetime in the epitaxial layer and the use of BN or the like when diffusing above 1250 ° C. (3) published 11 papers on bubble, eight of which were published by Bell Labs and International Business Machines Corporation. Which is worth noting several topics are described below.