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利用类Ni机制的Nd靶可以得到效率高、波长短的X光激光 ,在软X光激光实验中具有良好的应用前景 .Nd靶表面氧化层的情况对实验结果有着十分重要的意义 .为此用磁控溅射镀膜法制备了Nd靶 ,研究了Nd靶在不同环境气氛下的氧化过程 ,并初步探讨分析了氧化机理 ,提出了Nd靶的防氧化措施 .
The Nd-based Ni-like target can obtain high-efficiency and short-wavelength X-ray laser, which has a good prospect in soft X-ray laser experiment.The situation of the oxide layer on the surface of Nd target is of great significance to the experimental results The Nd target was prepared by magnetron sputtering method. The oxidation process of Nd target under different ambient atmosphere was studied. The oxidation mechanism was analyzed and the oxidation prevention measures of Nd target were put forward.