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利用射频磁控溅射系统在不同N2分压的条件下,制备了一系列ZrN/WN纳米多层膜.借助慢正电子湮没技术分析了样品的缺陷性质,采用纳米压痕仪研究了多层膜的力学性能.结果发现:N2分压为0.4Pa的多层膜具有最小的空位型缺陷浓度,其中心层和膜基结合层的平均S参数分别为0.4402和0.4641,而较低或较高的N2分压都可能导致空位型缺陷浓度的增加.随着空位型缺陷浓度的减小,多层膜的硬度和临界载荷增大.对于空位型缺陷浓度最小的多层膜,其硬度和临界载荷达到最大值,分别为34.8GPa和100mN,说明较低的缺陷浓度有利于提高多层膜的力学性能.
A series of ZrN / WN multilayered films were prepared by radio-frequency magnetron sputtering at different N2 partial pressures. The defect properties of the samples were analyzed by slow positron annihilation technique. The results show that the multilayer films with N2 partial pressure of 0.4Pa have the lowest density of vacancy defects and the average S-parameters of the center layer and the film-based bonding layer are 0.4402 and 0.4641 respectively, while the lower or higher The N2 partial pressure may lead to the increase of vacancies.The hardness and critical load of multilayers increase with the concentration of vacancy defects decreasing.The hardness and criticality of the multilayers with the lowest concentration of vacancy defects The maximum loads were 34.8 GPa and 100 mN, respectively, indicating that the lower defect concentration is conducive to improving the mechanical properties of multilayer films.