论文部分内容阅读
利用微波等离子体增强化学气相沉积技术制备出了CNx 薄膜 ,并利用x射线光电子能谱、x射线衍射、扫描电子显微镜和Raman光谱等测试手段对所制备的CNx 薄膜的微结构和成分进行了分析 .研究了其场致电子发射特性 .发现薄膜的结构和场发射特性与反应系中的甲烷、氮气及氢气的流量比有关 ,当甲烷、氢气及氮气流量比为 8 5 0 5 0sccm时 ,制备的薄膜具有弯曲层状的纳米石墨晶体结构 (类富勒烯结构 )和很好的场发射特性 .场发射阈值电场降低至 1 1V μm .当电场为 5 9V μm时 ,平均电流密度达 70 μA cm2 ,发射点密度大于 1× 10 4 cm- 2 .
CNx thin films were prepared by microwave plasma enhanced chemical vapor deposition. The microstructure and composition of the prepared CNx thin films were analyzed by X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscopy and Raman spectroscopy .The field emission characteristics of the films were investigated.The structure and field emission properties of the films were found to be related to the flow rates of methane, nitrogen and hydrogen in the reaction system. When the flow ratio of methane, hydrogen and nitrogen was 8500sccm, Has a curved layered nanocrystalline graphite structure (fullerene-like structure) and good field emission characteristics.The field emission threshold electric field is reduced to 1 1 V μm and the average current density is 70 μA at an electric field of 5 9 V μm cm2, the emission point density is greater than 1 × 10 4 cm-2.