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通过等离子合金化技术在不锈钢表面制备TiN薄膜,然后对TiN薄膜进行热氧化得到N掺杂TiO2薄膜。同时制备 TiO2薄膜作为对比研究。利用X射线衍射(XRD)、X射线光电子能谱(XPS)、扫描电子显微镜(SEM)及紫外-可见分光光度仪(UV-Vis)对得到的薄膜进行表征。XRD测试结果表明:经过450 °C氧化处理的薄膜中存在锐钛矿晶型的TiO2。经热氧化后薄膜表面均匀分布着尺寸接近的微小凸起物。TiO2和N掺杂TiO2的带隙分别为3.25eV和3.08eV。可见光下薄膜催化剂降解亚甲基蓝溶液的实验结果表明:N 掺杂TiO2薄膜比未掺杂TiO2薄膜的光催化效率明显高,可见光照射150min后对亚甲基蓝溶液的最终降解率为20%。
The TiN thin films were prepared on the stainless steel by plasma alloying, and then the TiN thin films were thermally oxidized to obtain N-doped TiO2 thin films. At the same time, TiO2 film was prepared as a comparative study. The obtained films were characterized by XRD, XPS, SEM and UV-Vis. XRD results show that there is anatase TiO2 in the film after oxidation at 450 ° C. After the thermal oxidation of the film surface evenly distributed with the size of the tiny protrusions close. The band gaps of TiO2 and N-doped TiO2 are 3.25eV and 3.08eV, respectively. The experimental results of degradation of methylene blue solution by thin-film catalyst under visible light show that the photocatalytic efficiency of N-doped TiO2 thin film is obviously higher than that of undoped TiO2 thin film. The final degradation rate of methylene blue solution after visible light irradiation for 150 min is 20%.