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随着微波集成电路、声表面波器件、超导电子元件等固体器件的发展,特别是大规模集成电路、超大规模集成电路的发展,微细加工技术成了世界上发达国家发展微电子技术的重中之重,我国也将其列为重点攻关项目之一。化学气相沉积、热扩散掺杂、光学系统曝光、湿法刻蚀战功地解决了2～3微米以上线宽图形的制作,称为第一代微细加工技术。以真
With the development of solid-state devices such as microwave integrated circuits, surface acoustic wave devices and superconducting electronic devices, especially the development of large-scale integrated circuits and very large-scale integrated circuits, the micro-fabrication technology has become the most important technology in developed countries in the world for the development of microelectronic technology China is also listed as one of the key research projects in our country. Chemical vapor deposition, thermal diffusion doping, optical system exposure, wet etching work successfully resolved 2 to 3 microns linewidth graphics production, known as the first generation of micro-processing technology. Really