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用锌靶反应性射频溅射制成了氧化锌薄膜.研究了不同的电阻率及沉积速率与溅射气氛中各种氧分压的关系.为了探索沉积薄膜的结晶性与沉积参数的关系,进行了透射电子衍射的研究.
Zinc target reactive RF sputtering was used to fabricate zinc oxide thin films.The relationship between different resistivities and deposition rates and the various oxygen partial pressures in the sputtering atmosphere was investigated.In order to explore the relationship between the crystallinity and deposition parameters of the deposited films, Transmission electron diffraction was studied.