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Tungsten coating is considered as a promising alternative material for plasma facing materials(PFC) in future fusion devices.The electro-deposition of tungsten in Na_2WO_4-ZnO-WO_3 melt at 1173 K on low activation steel substrates was studied in this work.Adherent and smooth tungsten films were deposited under various pulsed current conditions.The crystal structure and microstructure of tungsten deposits were characterized by XRD,SEM and EDX techniques.The results show that pulsed current density and duty cycle have a significant influence on tungsten nucleation and electro-crystallization phenomena.Uniform and smooth tungsten coating with high purity and high adherence is obtained on low active steel substrates as cathodic current density ranges from 35 to 25 mA·cm_(-2).
Tungsten coating is considered as a promising alternative material for plasma facing materials (PFC) in future fusion devices. The electro-deposition of tungsten in Na_2WO_4-ZnO-WO_3 melt at 1173 K on low activation steel substrates was studied in this work. Adherent and smooth tungsten films were deposited under various pulsed current conditions. crystal structure and microstructure of tungsten deposits were characterized by XRD, SEM and EDX techniques. The results show that pulsed current density and duty cycle have a significant influence on tungsten nucleation and electro-crystallization. phenomena. Uniform and smooth tungsten coating with high purity and high adherence was obtained on low active steel substrates as cathodic current density ranges from 35 to 25 mA · cm _ (-2).