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利用交流电沉积法,在减薄阻挡层的阳极氧化铝(AAO)模板上制备了金属Ni纳米线有序阵列。通过AFM、SEM、TEM、EDS、XRD和XPS等对纳米线进行了多方面的表征,结果表明:Ni纳米线的直径为65~75 nm,与AAO模板的孔径基本接近,纳米线呈实心线,具有多晶结构,其表面被氧化成NiO,但纳米线内部仍为Ni单质态;交流电沉积过程中,纳米线的生长经历了刚好生长至模板表面和纳米线超出模板表面以致连成一片而覆盖整个模板的两种状态。
Using alternating current deposition method, an ordered array of metallic Ni nanowires was fabricated on anodized aluminum (AAO) templates with reduced barrier layers. The nanowires were characterized by AFM, SEM, TEM, EDS, XRD and XPS. The results show that the diameter of Ni nanowires is about 65-75 nm, which is close to that of AAO template. The nanowires are solid lines , Which has a polycrystalline structure and the surface of which is oxidized to NiO, but the interior of the nanowire is still in the form of Ni. During the alternating current deposition, the growth of the nanowire has just gone to the surface of the template and the nanowires grow up beyond the surface of the template, Cover the entire template of the two states.