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电子技术的水平是现代化的重要标志之一。半导体器件则是电子工业的重要基础。随着半导体技术,尤其是大规模集成技术的迅速发展,要求更精确、更迅速地测定和控制在工艺过程中薄膜的厚度因而迫切需要相应的测量手段尽快跟上去。椭圆偏振光测厚仪。就是根据这种需要而研究的。设计和试制椭圆偏振光测厚仪,是大规模集成电路专用设备研制项目之一。开始是由北京无线电器件厂和北京大学电子仪器厂协作,进行设计,于75年试制出TP75型椭圆偏振光测厚仪,并于76年8月进行鉴定。在此基础
The level of electronic technology is one of the important symbols of modernization. Semiconductor devices are an important foundation for the electronics industry. With the rapid development of semiconductor technology, especially large-scale integration technology, the more accurate and rapid determination and control of the thickness of the film in the process therefore urgently needs the corresponding measuring method to keep up with. Elliptically polarized light thickness gauge. It is based on this need to study. Design and trial production of elliptically polarized thickness gage, is a large scale integrated circuit equipment for the development of one of the projects. The beginning was designed by Beijing Radio Equipment Factory and Peking University Electronic Instrument Factory. In the past 75 years, TP75-type ellipsometric thickness gauge was trial-produced and was appraised in August of 76th. Based on this