,Barrier Formation on a YBa2Cu3Oy Thin Film Using CF4 Plasma Fluorination

• 作 者: 阿巴斯 康琳 许伟伟 杨森祖 吴培亨
• 机 构: Research Institute of Superconductor Electronic, Department of Electronic Science and Engineering, N
• 出 处: 中国物理快报（英文版）
• 发表日期: 2002年6期

We investigate the surface structure and composition ofa YBa2Cu3Oy (YBCO) thin film modified by CF4 plasma fluorination. In addition to the absorption of hydrocarbons, chemical reactions of the YBCO surface take place during CF4 plasma treatment. Various x-ray photoelectron spectroscopic data are reported and discussed. The existence of a thin barrier is confirmed, which homogeneously covers the edge of the base YBCO film in our interface engineering Josephson junction. Measurements of Auger electron spectroscopic data and the resistance versus temperature indicate that the barrier is a controllable-insulating layer.