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采用射频磁控溅射法在石英基片上制备了厚度约为200nm的ZrW2O8薄膜。在不同温度下对薄膜进行热处理,通过X射线衍射和扫描电镜研究了热处理温度与热处理过程中通氧量大小对ZrW2O8薄膜组分与形态的影响。结果表明:在空气中热处理时,随着热处理温度的升高,薄膜由非晶态转变为晶态;经750℃处理的薄膜组成中ZrW2O8含量增大;热处理温度再升高,ZrW2O8逐步分解直至消失。在热处理过程中通入氧气,能使薄膜ZrW2O8含量增加,晶化效果更好,薄膜的形态更平整;在740℃热处理过程中通氧量达到20.8L/s后,再增加通氧量对薄膜的晶化影响不大。
A ZrW2O8 thin film with a thickness of about 200 nm was prepared on a quartz substrate by RF magnetron sputtering. The films were heat-treated at different temperatures. The effects of heat treatment temperature and the amount of oxygen in the heat treatment process on the composition and morphology of ZrW2O8 thin films were studied by X-ray diffraction and scanning electron microscopy. The results show that the content of ZrW2O8 increases with the increase of the heat treatment temperature and the content of ZrW2O8 increases with the increase of the heat treatment temperature. The heat treatment temperature increases and the ZrW2O8 gradually decomposes until disappear. In the heat treatment process, oxygen is introduced into the film to increase the content of ZrW2O8, and the crystallization effect is better and the morphology of the film is more smooth. When the oxygen content reaches 20.8 L / s during the heat treatment at 740 ° C., The crystallization of little effect.