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论述化学气相沉积技术(CVD)的基本原理、特点和在其基础上发展起来的几种具有广泛应用前景的CVD新技术,并分析比较它们发展的基础及存在的不足,旨在探讨化学气相沉积技术的发展方向。
Discusses the basic principles and characteristics of chemical vapor deposition (CVD) and several new CVD technologies with broad application prospect developed on the basis of them, and analyzes and compares the basis and existing problems of their development to explore the chemical vapor deposition Technology development.