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用计算机系统控制的激光制备高分辨率的集成电路掩模,制造成本低于标准光刻或电子扫描方法。其分辨率虽然比电子扫描方法低一倍,但却比通常的分步重复光刻法高二倍。并为瑞典研究所制造了具有窄至0.5微米线条的LSI掩模的原型设备和样机。激光扫描将最复杂的掩模从光刻法的20小时减少到1小时。在1:1的比例上,这个系统能在30分钟至1小时内产生2.5时见方的掩模。
Using computer-controlled lasers to make high-resolution integrated circuit masks is less costly than standard lithography or electronic scanning methods. Although its resolution is twice as low as that of the electronic scanning method, it is twice as high as that of the conventional step-and-repeat lithography. Prototype equipment and prototypes for LSI masks with lines as narrow as 0.5 microns were made for the Swedish Institute. Laser scanning reduces the most complex mask from 20 hours to 1 hour of photolithography. At a 1: 1 ratio, this system produces a 2.5 hrs square mask in 30 minutes to 1 hour.