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由离子和离子束技术形成的非晶碳膜具有良好的电绝缘性、对红外及可见光透明、硬度大、耐腐蚀等优良性质,可望在半导体器件、激光器件、太阳电池和材料保护等方面得到应用而受到重视。近年来很多作者先后报道了用未经质量分析的低能碳离子束直接沉积、离子束溅射沉积、离子镀、射频辉光放电离化碳氢化合物的等离子体沉积、经质量分析的低能碳离子束沉积等方法在单晶硅、玻璃、不锈钢等不同衬底上形成非晶碳膜的结果。碳膜的物理性质与沉积条件有密切关系,根据物理性质非晶碳膜大致可以分为三类,即导电、不透明的类石墨膜;绝缘、透明、质软的类聚合物膜;透明、绝缘、硬度大的类金刚石膜。
The amorphous carbon film formed by ion and ion beam technology has good electrical insulation, excellent properties of transparency to infrared and visible light, hardness, corrosion resistance and the like, and is expected to be used in the protection of semiconductor devices, laser devices, solar cells and materials Get the application and attention. In recent years, many authors have reported the deposition of low-energy carbon ion beams without mass analysis, ion beam sputtering deposition, ion plating, plasma deposition of radio frequency glow discharge ionized hydrocarbons, mass-analyzed low-energy carbon ions Beam deposition methods such as single crystal silicon, glass, stainless steel, such as the formation of different amorphous carbon film results. Carbon film physical properties and deposition conditions are closely related to the physical properties of amorphous carbon film can be roughly divided into three categories, namely conductive, opaque graphite-like film; insulating, transparent, soft polymer film; transparent, insulating , Hardness of diamond-like film.