The Effect of Discharge Power on the 02/TICl4 Plasma Deposition of TiO2 Atmospheric Pressure Non-equ

• 作 者: 王德信 杨沁玉 郭颖 丁可 张菁
• 机 构: StateKeyLaboratoryforModificationofChemicalFibersandPolymerMaterials,CollegeofScience
• 出 处: 东华大学学报：英文版
• 发表日期: 2012年5期
• 关键词: 等离体物理学 产生 约束 湍流 atmospheric pressure non-equilibrium Ar/ O2/ TiCl4 plasmaTiO2 d
• 基金项目: National Natural Science Foundations of China （No. 10835004, No. 10775031 ） , Science and Technology Commission of Shanghai Municipality, China （ No. 10XD1400100）

Deposition of TiO2 film from atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morphologies and controlled crystallization wer