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采用纯化学处理方法对NiTi形状记忆合金表面进行羟基磷灰石膜层的沉积,通过改变脉冲频率和脉冲处理时间,探讨了电脉冲作用下钙化处理对NiTi形状记忆合金表面涂膜的影响,分析了不同浓度配置的钙化液,以及脉冲参数对试样表面羟基磷灰石膜层生长的响应规律。结果表明:浓度为Ca2+3.10 mmol/L,K+4.64 mmol/L,Na+126.8 mmol/L,Cl-144.5 mmol/L,HPO42-1.86 mmol/L,pH值呈弱碱性的钙化液最适合于钙磷层的生长;经适当处理后,试样表面生成了疏松多孔的钙磷层,经检测其为羟基磷灰石和其他钙磷盐的混合物;电脉冲的加入在一定程度上加速了钙磷层的沉积,并提高了生成的羟基磷灰石膜的纯度。
The pure NiTi shape memory alloy was treated by pure chemical method to deposit the hydroxyapatite layer. The effects of calcification on the surface coating of NiTi shape memory alloy were discussed by changing the pulse frequency and pulse processing time. The different concentrations of calcification solution, as well as the pulse parameters on the sample surface hydroxyapatite film growth response. The results showed that the calcification solution with weakly alkaline pH value was the most active one with Ca2 + concentration of 3.10 mmol / L, K + 4.64 mmol / L, Na + 126.8 mmol / L, Cl- 144.5 mmol / L and HPO42-1.86 mmol / Suitable for the growth of calcium and phosphorous layer; after appropriate treatment, the surface of the sample was formed loose porous calcium and phosphorus layer, which was tested as a mixture of hydroxyapatite and other calcium and phosphorus salts; electrical pulse to some extent, to accelerate The deposition of calcium and phosphorus layers, and to improve the purity of the hydroxyapatite film generated.