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产品编号:10361R456内容摘要:该产品为表面分析提供了最灵敏的技术(系数增加100倍)。可用于材料表面或表面层中痕量杂质的定量元素分析。这种仪器包括一个用激光将样品的中性原子溅射离化的离子源和一个同时进行能量和角度再聚焦的时间飞渡质谱计。关键的设计考虑是有效利用样品原子和强烈抑制噪声源。对硅样品中铁原子杂质检
Article Number: 10361R456 Abstract: This product provides the most sensitive technique for surface analysis (a factor of 100 increases). It can be used for quantitative elemental analysis of trace impurities in material surface or surface layer. The instrument includes an ion source that sputters the sample’s neutral atoms with a laser and a fly-by-pass mass spectrometer that performs both energy and angle refocusing. The key design consideration is the efficient use of sample atoms and strong suppression of noise sources. Examination of impurities in iron in silicon samples