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利用固相反应法制备纳米二氧化锡磨料并研究了制备条件对平均粒径的影响。结果表明,在500℃/4h条件下制得的纳米二氧化锡粉体在水中有良好的分散性和稳定性。利用自制的抛光液对高纯钌片进行化学机械抛光,与二氧化硅磨料抛光液比较,材料去除速率和表面粗糙度都降低。当抛光液中含1%(质量分数,下同)二氧化锡、1%过硫酸铵、1%酒石酸和3mmol/L咪唑,pH=8.0,抛光压力为17.24kPa时,材料去除速率(MRR)和表面粗糙度(Ra)分别为6.8nm/min和4.8nm。
The nano-sized tin dioxide abrasive was prepared by solid-state reaction method and the influence of the preparation conditions on the average particle size was studied. The results show that the nano-sized tin dioxide powder prepared at 500 ℃ / 4h has good dispersibility and stability in water. The chemical mechanical polishing of the high purity ruthenium sheet with the homemade polishing solution showed that the material removal rate and the surface roughness decreased compared with the silica abrasive slurry. When the polishing solution contained 1% (mass fraction) of tin dioxide, 1% ammonium persulfate, 1% tartaric acid and 3 mmol / L imidazole, the pH was 8.0 and the polishing pressure was 17.24 kPa, the material removal rate (MRR) And surface roughness (Ra) were 6.8 nm / min and 4.8 nm, respectively.