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本文采用无水的氯化钕和氯化钇及硅粉作为起始原料,在高压釜中在650℃的温度条件下,通过还原鄄硅化途径成功地合成了硅化钕(NdSi2)和硅化钇(YSi2)。X射线衍射结果显示他们分别是四方相的二硅化钕和六方相的二硅化钇结构。透射电镜照片表明他们的平均粒径分别是40nm和60nm。样品的光致发光结果说明他们在波长分别为441nm和366nm处能发光。热重曲线显示他们在流动空气的介质中在550℃以下具有很好的抗氧化性。
In this paper, neodymium chloride (NdSi2) and yttrium silicide (NdSi2) were synthesized by reduction and sulfonation using anhydrous neodymium chloride, yttrium chloride and silica fume as starting materials in an autoclave at 650 ℃. YSi2). X-ray diffraction results show that they are tetragonal neodymium disilicide and hexagonal phase disilicide structure. Transmission electron micrographs showed that their average particle size was 40 nm and 60 nm, respectively. The photoluminescence results of the samples show that they can emit light at wavelengths of 441 nm and 366 nm, respectively. Thermogravimetric curves show that they have good oxidation resistance below 550 ° C in flowing air media.