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试验了好几种可用来改善半导体生产洁净室中沾污控制法的新工艺。描述了一种经过改进的层流柜,它允许工人接触柜里的器件而不让周围的灰尘侵入工作面。还讨论了修改传统的洁净服,以便防止从衣领和袖口漏出的灰尘、皮屑和细菌,同时使洁净服更经久耐穿。最后,还考虑了去除微细粒子而不限制过滤器压力下降的空气过滤改进办法。
Several new techniques were tested for improving the contamination control method in semiconductor manufacturing cleanrooms. Describes an improved laminar flow cabinet that allows workers to access the components in the cabinet without letting the surrounding dust intrude into the work surface. Also discussed is the modification of traditional clean clothes to prevent dust, dander and bacteria leaking from the collar and cuffs, while making the clean clothes more durable. Finally, improvements in air filtration to remove fine particles without limiting filter pressure drop are also considered.