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采用溅射离子镀工艺,按照不同成份已生产出了氟化钛铝膜。在 TiAl 比为50:50%的靶上,通过反应溅射,所沉积的膜成份为:Ti27.5%、A128.9%、N_243.6%。发现晶体结构只有4.2×10~(-7)毫米的晶格参数是氯化钠,这种膜的显微硬度是 HV2100—2300。将 Al 掺入氮化膜中改进了抗氧化性能,也改进了涂 TiAlN 钻头的性能。TiN 膜开始氧化的温度是550℃,然而 TiAlN 涂层与热空气激烈反应的温度为800℃。镀 TiAlN 的钻头,用两种不同的钢作了试
Sputter ion plating process, in accordance with the different components have been produced titanium aluminum fluoride film. On the target having a TiAl ratio of 50: 50%, the film components deposited by reactive sputtering were: Ti 27.5%, A 128.9% and N 243.6%. It is found that only 4.2 × 10 ~ (-7) mm crystal lattice parameter is sodium chloride, this film has a hardness of HV2100-2300. Incorporating Al into the nitride film improves the oxidation resistance and also improves the performance of the TiAlN coated drill. The temperature at which the TiN film started to oxidize was 550 ° C, whereas the temperature at which the TiAlN coating reacts violently with hot air was 800 ° C. TiAlN-plated drill bits were tested with two different steels