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为了消除机械掩模的尺寸限制和阴影效应,采用基于光刻掩膜的组合刻蚀法来制备阶跃滤光片,并成功地实现了16×1通道阶跃滤光片式微型分光器件的制备,该分光器件中滤光片单元的宽度只有90μm,总体尺寸不到2 mm。各滤光片通道分布在632.4 nm到739.6 nm之间,带宽均小于2.9 nm,透过率均高于70%,这样的阶跃滤光片最小单元尺寸可达微米量级,阴影效应可减小到微米甚至亚微米量级,与电荷耦合器件(CCD)完全匹配,可以作为微型分光器件来构建应用于空间等领域的微型光谱系统,从而促进相应光潜仪器的微型化。
In order to eliminate the size limitation and shadow effect of the mechanical mask, a step filter is prepared by a combined etching method based on a photolithographic mask, and a 16 × 1 channel step filter type micro-spectrometer The width of the filter element in the beam splitter was only 90 μm and the overall size was less than 2 mm. The filter channels are distributed between 632.4 nm and 739.6 nm with bandwidths less than 2.9 nm and transmit rates higher than 70%. The minimum cell size of such a step filter can be on the order of micrometers and the shadow effect can be reduced As small as micrometers or even submicrometers, they are perfectly matched with charge-coupled devices (CCDs) and can be used as miniature spectroscopic devices to build miniature spectroscopic systems for applications in space and other fields, thereby contributing to the miniaturization of the corresponding phototoolless devices.