Influences of post-annealing and internal stress on magnetoresistance properties of Ni80Fe20 films

• 作 者: 高艳清 吴平 蔡恩静 邱宏 王凤平 潘礼庆 田跃
• 机 构: DepartmentofPhysics
• 出 处: 中国有色金属学会会刊：英文版
• 发表日期: 2005年2期
• 关键词: 镍80铁20薄膜 退火处理 内部压力 各向异性 磁致伸缩 Ni_(80)Fe_(20) film annealing internal stress an
• 基金项目: 北京科技大学校科研和教改项目

Ni80 Fe20 films with thickness about 54 nm were deposited on K9 glass and thermally oxidized silicon substrates at ambient temperature by electron beam evaporation with deposition rate about 1.8 nm/min. The as-deposited films were annealed at 350, 450 and