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利用磁控溅射法在单晶硅上制备了不同层厚比的WS_x/a-C纳米多层膜(调制周期约50 nm)。用扫描电镜、X射线衍射、能谱、X射线光电子谱和Raman光谱对薄膜的形貌、成分和组织结构等进行了表征。采用纳米压痕仪、划痕仪和球盘式摩擦仪测试了薄膜的硬度、结合力和在大气环境下(相对湿度约70%)的摩擦学性能。结果表明:随着层厚比L_(a-C)/L_(WS_x)的增加,多层膜的n_s/n_w比由1.38增大至1.62,并伴随着WS_2尺寸的减小以及薄膜致密度和平整度的提高,a-C层和WS_x层的结构无明显变化;多层膜的磨损率仅为纯WS_x膜的1/3~1/4,摩擦因数由0.26降至0.2,硬度和磨损率均出现峰值,而结合力呈相反变化趋势。层厚比L_(a-C)/L_(WS_x)为1:39的多层膜的摩擦因数为0.26,磨损率为9.8×10~(-14)m~3/Nm,耐磨性最佳。
WS_x / a-C nano-multilayers with different layer thickness ratios (about 50 nm in modulation period) were prepared on single crystal silicon by magnetron sputtering. The morphology, composition and microstructure of the films were characterized by scanning electron microscopy, X-ray diffraction, energy dispersive spectroscopy, X-ray photoelectron spectroscopy and Raman spectroscopy. The hardness, cohesion and tribological properties of the films were measured with a nano indenter, a scratch tester and a ball-and-pocket friction tester under atmospheric conditions (relative humidity of about 70%). The results show that the n_s / nw ratio increases from 1.38 to 1.62 with the increase of Lc / L_ (WS_x) and decreases with the decrease of WS_2 size and the film density and flatness , The structure of aC layer and WS_x layer did not change obviously. The wear rate of multi-layer film was only 1/3 ~ 1/4 of that of pure WS_x film, the friction coefficient decreased from 0.26 to 0.2, and both the hardness and the wear rate peaked. The binding force showed the opposite trend. The multi-layer film with layer thickness ratio L a-C / L WSx of 1:39 has a wear coefficient of 0.26 and a wear rate of 9.8 × 10 ~ (-14) m ~ 3 / Nm.