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研究了反应溅射ＡｌＮ和ＡｌＳｉＮ薄膜的制备工艺，讨论了它们的光学性能与溅射工艺参数的关系，实验结果表明，在优化制备工艺基础上能制备出具有优良光学性能（高折射率、低消光系数、高透射率）的ＡｌＮ及ＡｌＳｉＮ薄膜。
The preparation process of reactive sputtering AlN and AlSiN thin films was studied. The relationship between their optical properties and sputtering process parameters was discussed. The experimental results show that the AlN and AlSiN thin films with excellent optical properties (high refractive index, low Extinction coefficient, high transmittance) of AlN and AlSiN films.