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本文用射频反应磁控溅射制备了SiCN薄膜 ,对薄膜的化学成分、结构进行了研究。结果表明 ,反应气体N2 、Si、C三者之间形成了Si-C、Si-N和C -N键 ,构成了复杂的网络结构。成分分析表明薄膜的化学计量式近似为SiCN。对比分析了反应溅射制备SiCN、CNx、SiNy和SiCz 薄膜的FTIR谱
In this paper, RF reactive magnetron sputtering SiCN film was prepared, the chemical composition of the film, the structure was studied. The results show that Si-C, Si-N and C-N bonds are formed between N2, Si and C, forming a complicated network structure. Compositional analysis shows that the stoichiometry of the film is approximately SiCN. The FTIR spectra of SiCN, CNx, SiNy and SiCz thin films prepared by reactive sputtering