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由河南四方达超硬材料股份有限公司张春林、牛同健、赵东鹏、马姗姗、方海江申请的减小应力的抗冲击聚晶金刚石复合片获得实用新型专利(专利号201521095298.5)。该实用新型公开了一种减小应力的抗冲击聚晶金刚石复合片,该聚晶金刚石复合片内部应力小,包括聚晶金刚石层和位于聚晶金刚石层下方的硬质合金基体,在聚晶金刚石层中心处设有圆柱状填
By the Henan Sifang Superhard Materials Co., Ltd. Zhang Chunlin, Niu Tongjian, Zhao Dongpeng, Ma Shanshan, Fang Haijiang to reduce stress on the impact of polycrystalline diamond compact obtained utility model patents (Patent No. 201521095298.5). The utility model discloses a stress-reducing impact-resistant polycrystalline diamond compact, which has small internal stress and comprises a polycrystalline diamond layer and a cemented carbide substrate located under the polycrystalline diamond layer. In the polycrystalline The center of the diamond layer with cylindrical filling