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分析了热蒸发、溅射和脉冲激光沉积三种镀膜技术镀金属薄膜的性能特点。根据文献报道数据,研究了三种镀膜技术镀金属薄膜的成膜机理、晶格参数、膜力学性能的差别。脉冲激光沉积镀膜易按层与层叠加方式成膜,薄膜应力小,缺陷少,晶格尺寸大,而热蒸发和溅射镀膜多按三维岛式生长成膜,薄膜应力较大,因应力诱发较多缺陷与位错,晶格尺寸相对要小。脉冲激光沉积粒子能量高,能够实现氢化物一步成膜,薄膜性能更佳。脉冲激光沉积技术更有利于制备聚变应用的金属氢化物薄膜。
The performance characteristics of metallized films with three kinds of coating technologies, such as thermal evaporation, sputtering and pulsed laser deposition, are analyzed. According to the reported data, the film forming mechanism, lattice parameters and mechanical properties of three kinds of coating technology were studied. Pulsed laser deposition coating is easy to form by film and layer stacking, the film stress is small, the defect is small, the crystal lattice size is large, while the thermal evaporation and sputtering film are mostly formed by three-dimensional island growth, the film stress is larger, stress induced More defects and dislocations, the lattice size is relatively small. Pulsed laser deposition of high energy particles can be one step hydride film, film performance better. Pulsed laser deposition technology is more conducive to the preparation of fusion applications of metal hydride film.