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本文介绍了一种具有高速消隐和可变束流的二级透镜聚焦离子束（ＦＩＢ）系统的设计原理和方法。在这种新的二级透镜ＦＩＢ系统中，采用了束径束流的双工作模式和一种新的电可调无级可变束径束流方案，使二级系统既可用于需要大束流的ＴＯＦ─ＳＩＭＳ和刻蚀粗加工，又可用于需要小束径的高分辨扫描离子显微镜和刻蚀精加工以及ＦＩＢ暴光、变蚀等其它微细加工。设计中提出了逐级可测试性设计原则，解决了多级系统中对中调整和测试的困难。计算了透镜系统的离子光学性能和各种参数对束径束流的影响。最后对系统进行了初步的调试，束斑达到０．１μｍ，得到了预期的结果。
This paper presents a design principle and method of a two-lens Focused Ion Beam (FIB) system with high-speed blanking and variable beam current. In this new two-lens FIB system, a dual-mode beam-beam mode and a new electrically tunable infinite-beam-variable beam mode are used to make the two-stage system suitable for applications requiring large beam currents TOF-SIMS and Etch Roughing, but also for high-resolution scanning ion microscopes and etch finishing that require small beam paths, and other microfabrication of FIB exposure, erosion, and more. In the design, the principle of step-by-step testability design was put forward to solve the difficulty of adjustment and testing in the multi-level system. The effects of ion optical properties and various parameters of the lens system on the beam diameter were calculated. Finally, the system was initial debugging, beam spot to 0.1μm, the expected results.