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采用离子束辅助磁控溅射工艺制备CrNx薄膜,研究了不同氮气流量下薄膜微观形貌,组织结构以及力学性能的变化。采用台阶仪测量薄膜的厚度,采用场发射扫描电镜、扫描探针显微镜、X射线衍射仪测试薄膜的表面形貌特征以及组织结构,采用纳米压痕仪测试薄膜的硬度以及弹性模量。实验结果表明,随氮气流量增加,薄膜沉积速率先降低后保持稳定,粗糙度先减小后增加,相组成由Cr2N相转变为CrN相,硬度、弹性模量先增加后降低。由于Ar离子束的辅助轰击以及N离子的高反应活性,在氮气流量为10 ml/min时,获得了结构致密,表面光滑,晶粒细小,相组成为Cr2N的力学性能优异的薄膜。
CrNx thin films were prepared by ion beam assisted magnetron sputtering. The microstructure, mechanical properties and microstructure of the films were studied under different nitrogen fluxes. The thickness of the film was measured by a step-meter. The surface morphology and microstructure of the film were measured by field emission scanning electron microscopy, scanning probe microscope and X-ray diffraction. The hardness and elastic modulus of the film were measured by nanoindentation. Experimental results show that with the increase of nitrogen flow rate, the film deposition rate first decreases and then remains stable, the roughness first decreases and then increases, and the phase composition changes from Cr2N phase to CrN phase. The hardness and elastic modulus first increase and then decrease. Due to the auxiliary bombardment of Ar ion beam and the high reactivity of N ions, a thin film with compact structure, smooth surface, fine grains and excellent mechanical properties with phase composition of Cr2N was obtained at a nitrogen flow rate of 10 ml / min.