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同步辐射光刻技术是Ｘ射线光刻技术的重要发展，适用于深亚微米乃至纳米级图形的 超微细加工，特别是ＬＩＧＡ技术的出现大大拓展了同步辐射光刻的应用领域．使它不仅适合于超大规模 集成电路等平面微结构的加工，也适合于具有复杂构造的三维立体结构和器件的制作．文章简要介绍了 ＮＳＲＬ光刻光束线和实验站概况及研究工作进展．
Synchrotron radiation lithography is an important development of X-ray lithography. It is suitable for the ultrafine processing of deep sub-micron and even nano-scale patterns. In particular, the emergence of LIGA technology has greatly expanded the application field of synchrotron radiation lithography. It is not only suitable for the processing of planar microstructures such as very large scale integrated circuits, but also for the fabrication of three-dimensional structures and devices with complicated structures. The article briefly introduced the NSRL lithography beam line and experimental station overview and research work.